Case Number: App_475372/2023 Patent number: EP3844319 - COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMSProceeding type: ApplicationAction/Application: DérogationApplicants: Clarivate Represented by Iva MatkovicCourt Division: appealInstance - seat - LuxembourgDate of Formal receipt: 2023-06-02 19:58:50